International Journal of Chemical Studies
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P-ISSN: 2349-8528, E-ISSN: 2321-4902   |   Impact Factor: GIF: 0.565

Vol. 8, Issue 5 (2020)

Effect of temperature stress on seedling growth and development in soybean [Glycine max (L.) merrill] genotypes


Author(s): MK Rathod, RW Bharud and Neeraj Nath Parihar

Abstract: Temperature is an environmental factor that has a considerable influence on seedling growth and development. It plays a role in seed development, controlling seed yield, composition, and vigor. A laboratory experiment was conducted at Central Phytotron Facility during 2017-2018 in Completely Randomized Block Design (CRD) with two replications. Twenty genotypes were exposed to various temperature regimes viz; control (T1), day/night temperature regime 300C/25 0C (T2), 32 0C/27 0C (T3), 340C/290C (T4), and 36 0C/31 0C (T5) under phytotronic conditions for germination in growth chambers 1, 2, 3, 4, and 5 respectively. Ten seeds per replication were sown in Petri plates and were exposed to above temperature regimes upto 8 days and 10000 foot candle light and 1000 ppm CO2 was provided. Among the genotypes KDS-904 (97.75%) recorded significantly maximum shoot length stress tolerance index percent followed by KDS-1032 (97.43%) while genotype KDS-344 (92.36%) recorded significantly minimum shoot length stress tolerance index percent on the eight day. Similarly among the different interactions day/night temperature regime 36/31 0C treatment on eighth day, genotype DS-288 recorded significantly maximum total seedling length (10.72 cm) followed by same genotype (10.47 cm) under day/night temperature regime 32/27 0C whereas genotype KDS-904 recorded significantly minimum seedling length (3.73 cm) under control treatment.

DOI: 10.22271/chemi.2020.v8.i5d.10305

Pages: 259-263  |  555 Views  73 Downloads

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How to cite this article:
MK Rathod, RW Bharud, Neeraj Nath Parihar. Effect of temperature stress on seedling growth and development in soybean [Glycine max (L.) merrill] genotypes. Int J Chem Stud 2020;8(5):259-263. DOI: 10.22271/chemi.2020.v8.i5d.10305
 

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