Vol. 6, Issue 5 (2018)
Mechanism of copper tolerance in Trichoderma asperellum (MH593785): A key component in the consortium of Copper-Chitosan- Trichoderma
Author(s): Akansha Singh, Erayya and J Kumar
Abstract: In this study, electron microscopy of copper tolerant and copper sensitive Trichoderma asperellum isolates revealed that T. asperellum (MH593785) had copper tolerance properties as copper was adsorbed in/on the fungal cell wall along with some morphological alteration such as hyphal swelling, while mycelia of T. asperellum strain TCMS 5 (copper sensitive isolate) got collapsed along with ultra-structural changes such as shrinking of cytoplasmic material, destruction of mycelia due to penetration of copper ions into the cell membrane and increase in the vacuole size. EDX studies of CuOH (500 ppm) amended T. asperellum (MH593785) isolate showed 1.78% of copper peak area while in control copper peak was not detected. Fatty acid profiling showed that octadecenoic acid derivatives (9.67%), octadecadienoic acid derivatives (17.46%), hexadecanoic acid (4.37%) and petroselinic acid (2.51%) were found to be significantly higher in copper treated Trichoderma as compared to control. petroselinic acid peak was found in CuOH (500ppm) amended T. asperellum culture only. Phospholipids play an important role in metal ions movement across the plasma membrane. In our study, high amount of phospholipid was observed in control (3.73%) while in CuOH-500 (ppm) treated T. asperellum (MH593785) less amount (1%) of phospholipid was observed. Fatty acid profiling of CuOH tolerant T. asperellum (MH593785) proved that modulation in total fatty acid content in presence of CuOH (500ppm) made the plasma membrane stable in copper amended PDB media.
Pages: 2285-2293 | 633 Views 159 Downloads
download (9300KB)
How to cite this article:
Akansha Singh, Erayya, J Kumar. Mechanism of copper tolerance in Trichoderma asperellum (MH593785): A key component in the consortium of Copper-Chitosan- Trichoderma . Int J Chem Stud 2018;6(5):2285-2293.
