Vol. 4, Issue 4 (2016)
Electrochemical fabrication of atom-scale iron quantum wire combined with advanced lithography technique
Author(s): Hui Yang, Liyun Yuan and Xiaodong Dong
Abstract: A method to fabricate atom-scale iron quantum wire was described. The method included two steps. First, an Au nanogap was formed by a series of lithography process on Si substrate. Then the iron atoms were deposited into the gap to form stable iron quantum wire by a home-made electrochemically controlled system. By careful controlling the etching/deposition process, stepwise conductance behavior could be clearly observed. The I-V curve of the formed iron quantum wire showed the ohmic behavior with low bias voltage. The work is of great significance for molecular electronics, interface electrochemistry and sensing.
Pages: 213-215 | 1214 Views 34 Downloads
How to cite this article:
Hui Yang, Liyun Yuan, Xiaodong Dong. Electrochemical fabrication of atom-scale iron quantum wire combined with advanced lithography technique. Int J Chem Stud 2016;4(4):213-215.